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SUMMARY:Site specific residual stress analysis using focused ion beam mach
 ining - Richard Langford\, Biological and Soft Systems (BSS) Sector\, Cave
 ndish Laboratory
DTSTART:20090205T160000Z
DTEND:20090205T170000Z
UID:TALK15339@talks.cam.ac.uk
CONTACT:Stephen Walley
DESCRIPTION:Focused ion beam systems are versatile tools for micro and nan
 oengineering. Here two simple FIB based methods are reported for site spec
 ific residual stress analysis. In addition\, the amount of stress induced 
 in silicon through FIB milling and implantation will be discussed.    
LOCATION:Mott Seminar Room\, Cavendish Laboratory\, Department of Physics
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