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SUMMARY:Block copolymer directed self-assembly for lithographic applicatio
 ns - Dr. Hiroshi Yoshida\, Chief Researcher\, Hitachi Research Laboratory\
 , Hitachi\, Ltd.
DTSTART:20091023T130000Z
DTEND:20091023T140000Z
UID:TALK21055@talks.cam.ac.uk
CONTACT:Andy Irvine
DESCRIPTION:Demand for ever smaller critical dimensions in the electronic 
 devices continue pressing conventional photolithography beyond the diffrac
 tion limit. Scientific and technological challenges arise as resolution re
 quirements approach molecular length scales and the economics of new litho
 graphic technologies become prohibitively expensive. Self-assembling struc
 tures at the nanometer scale have emerged as a way to overcome these limit
 ations. Block copolymer\, which self-assembles a wide variety of periodic 
 nano-domain structures\, stands out as a promising alternative to produce 
 features in the 10nm scale. In this paper\, methods such as graphoepitaxy 
 and chemical registration proposed to precisely control the self-assembly 
 of block copolymer are overviewed and potential of the technology is discu
 ssed focusing on pattern density multiplication technique for lithographic
  application.\n\nBiography\nHY received Dr. of Eng. degree in polymer chem
 istry from Kyoto University in 1992. In 1993\, he joined Hashimoto Polymer
  Phasing Project\, ERATO\, Japan Science & Technology Organization. In 199
 8\, he became a research staff in Hitachi Research Laboratory\, Hitachi Lt
 d. and currently is a Chief Researcher.\n\nReferences\n1) Polymer 50\, 425
 0–4256 (2009).\n2) Macromolecules 41\, 9267-9276 (2008).\n3) Langmuir 23
 \, 6404-6410 (2007).
LOCATION:Microelectronics Research Centre Seminar Room\, Cavendish Laborat
 ory (or Bragg Room 213 if unavailable)
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